2005
吉武 剛
“室温で成長するナノ微結晶FeSi2半導体とFe3Si強磁性体”
機能材料：シリサイド半導体の最新動向，10月号，27-30頁，2005
T. Yoshitake, D. Nakagauchi, T. Ogawa, M. Itakura, N. Kuwano, Y. Tomokiyo, T.
Kajiwara, and K. Nagayama
“Room-temperature epitaxial growth of ferromagnetic Fe3Si films on Si(111) by
facing target direct-current sputtering“
Appl. Phys. Lett.
Vol.
86, 262505 (2005)
梶原 寿了， 武田 薫， 吉武 剛
対向ターゲット式DCスパッタリング法により作製した強磁性Fe３Si/半導体FeSi２積層膜の磁気特性
福岡工業大学エレクトロニクス研究所年報，2005
2004
Takeshi Hara, Tsuyoshi Yoshitake, Tomohito Fukugawa, Ling yun Zhu, Masaru Itakura, Noriyuki Kuwano, Yoshitsugu Tomokiyo and Kunihito Nagayama.
“Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere”
Diamond and Rel. Mater. Vol. 13 (2004) 679–683.
Takeshi Hara, Tsuyoshi Yoshitake, Tomohito Fukugawa, Ling yun Zhu, Masaru Itakura, Noriyuki Kuwano, Yoshitsugu Tomokiyo and Kunihito Nagayama
“Consideration of diamond film growth on various orientation substrates of diamond in an oxygen and a hydrogen atmospheres by reactive pulsed laser deposition”
Diamond Rel. Mater. Vol. 13 (2004) 622–626.
T. Yoshitake and K. Nagayama
“The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter”
Vacuum, Vol. 74 (2004) 515–520.
D. Nakagauchi, T. Yoshitake and K. Nagayama
“Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target”
Vacuum, Vol. 74 (2004) 653–657.
Tsuyoshi YOSHITAKE, Takeshi HARA, Tomohito FUKUGAWA, Ling yun ZHU, Masaru ITAKURA, Noriyuki KUWANO, Yoshitsugu TOMOKIYO and Kunihito NAGAYAMA1
“Low-Temperature Growth of Nanocrystalline Diamond by Reactive Pulsed Laser Deposition under a Hydrogen Atmosphere”
Jpn. J. Appl. Phys. Vol. 43 (2004) pp. L 240–L 242.
Taizoh Sadoh*, Masakazu Owatari,
Yuji Murakami, Atsushi Kenjo, Tsuyoshi Yoshitake1, Masaru Itakura1 and Masanobu
Miyao
“Formation of β-FeSi2-xGex by Ge-Segregation-Controlled Solid-Phase Growth of
[a-Si/a-FeSiGe]n Multilayered Structure”
Jpn. J. Appl. Phys.
Vol.
43 (2004) pp. 1879-1881
小川哲也，中垣内 大，吉武 剛， 板倉 賢，桑野 範之，友清 芳ニ、大橋政司，巨海玄道、梶原寿了，永山邦仁
Fe-Si系による強磁性相/半導体相積層膜の作製とその評価
電離気体実験施設報告書、第14号、2004.
PLD法によるナノ微結晶ダイヤモンド薄膜の作製
福川知仁、原 武嗣、吉武 剛、板倉 賢、桑野範之、友清芳二、永山邦仁
電離気体実験施設報告書、第14号、2004.
2003
Dai Nakagauchi, Tsuyoshi Yoshitake and Kunihito Nagayama
"Fabrication of ferromagnetic Fe3Si / semiconducting nanocrystalline FeSi2 multi-layered film by a facing targets DC sputtering method"
Proceedings of The 5th Cross Straits Symposium on Materials, Energy and Environment Sciences, (2003).
Tomohito FUKUGAWA, Takeshi HARA,
Tsuyoshi YOSHITAKE, Ling yun Zhu, Masaru ITAKURA,
Noriyuki KUWANO, Yoshitsugu TOMOKIYO, and Kunihito NAGAYAMA
"Consideration of diamond growth on various orientation substrates in ambient oxygen and hydrogen by pulsed laser deposition"
Proceedings of The 5th Cross Straits Symposium on Materials, Energy and Environment Sciences, (2003).
Yosuke INOKUCHI, Tsuyoshi YOSHITAKE, Taizo SADOH, Masanobu MIYAO, and Kunihito NAGAYAMA
"Optical and electrical properties of b-FeSi２ thin films grown on Si by a facing target DC sputtering method"
Proceedings of The 5th Cross Straits Symposium on Materials, Energy and Environment Sciences, (2003).
Ichiro TANAKA, Tsuyoshi YOSHITAKE, Shigeto OKADA, Jun-ichi YAMAKI and Kunihito NAGAYAMA
"Epitaxial growth of LiCoO2 thin films on sapphire substrates"
Proceedings of The 5th
Cross Straits Symposium on Materials, Energy and Environment Sciences,
(2003).
Wataru Yokoyama, Tsuyoshi Yoshitake and Kunihito NAGAYAMA
"Epitaxial as-growth of beta-FeSi2 thin film on Si(111) by pulsed laser deposition"
Proceedings of The 5th
Cross Straits Symposium on Materials, Energy and Environment Sciences,
(2003).
D. Nakagauchi, T. Yoshitake and K. Nagayama
"Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target"
Proceedings of The
Seventh International Symposium on Sputtering and Plasma Processes (ISSP2003),
(2003) 522-525.
T. Yoshitake, M. Yatabe and K. Nagayama
"Semiconducting amorphous iron silicide thin films by pulsed laser deposition using a FeSi2 target"
Proceedings of The
Seventh International Symposium on Sputtering and Plasma Processes (ISSP2003),
(2003) 530-533.
T. Hara, T. Yoshitake and K. Nagayama
"Growth of diamond thin films on various orientation substrates in an oxygen atmosphere by pulsed laser ablation of graphite"
Proceedings of The
Seventh International Symposium on Sputtering and Plasma Processes (ISSP2003),
(2003) 526-529.
T. Yoshitake and K. Nagayama
"The vane velocity filter for eliminating droplets ejected by pulsed laser deposition"
Proceedings of The Seventh International Symposium on Sputtering and Plasma Processes (ISSP2003), (2003) 371-374.
T. Yoshitake, M. Yatabe, M. Itakura, N. Kuwano, Y. Tomokiyo, and K. Nagayama
"Semiconducting nanocrystalline iron disilicide thin films prepared by pulsed-laser ablation"
Appl. Phys. Lett., Vol. 83 (2003) 3057-3059.
原 武嗣、吉武 剛、西山貴史、永山邦仁
”レーザーアブレーション法におけるダイヤモンド薄膜成長機構に関する考察”
電気学会論文誌A, 123巻, 9号, 939-944.
Y. Murakami, I. Tsunoda, H. Kido, A. Kenjo, T. Sadoh, M. Miyao and T. Yoshitake
"Enhanced solid-phase growth of β-FeSi2 bypre-amorphization"
Nuclear Instrument and Methods in Physics Research B 206 (2003) 304-307.
Tsuyoshi Yoshitake, Dai Nakagauchi, and Kunihito Nagayama
"Ferromagnetic Ironsilicide Thin Films Prepared by Pulsed Laser Deposition"
Jpn. J. Appl. Phys., Vol.42 (2003) No.7B pp.L849 - L851.
田中一郎、吉武 剛、岡田重人、山木準一、永山邦仁
”レーザーアブレーション法によるLiCoO2薄膜の作製とその電気化学的特性”
電離気体実験施設報告、第13号 (2003) 28-29頁
Dai Nakagauchi, Tsuyoshi Yoshitake and Kunihito Nagayama
"Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition"
Report of institute for ionized gas and laser research, 13 (2003) 26-27.
Tsuyoshi Yoshitake, Takeshi Hara, and Kunihito Nagayama
"The influence of the repetition rate of laser pulses on the growth of diamond thin films by pulsed laser ablation of graphite"
Diamond Rel. Mater. Vol. 12 (2003) 306-309.
2002
Takeshi Hara, Tsuyoshi Yoshitake,
and Kunihito Nagayama
" The influence of the repetition rate of laser pulses on the growth of diamond
thin films by pulsed laser ablation of graphite"
to be published in Proceeding of 4th Cross Straits Symposium on Materials,
Energy and Environment Sciences
吉武 剛、由利彰崇、永山邦仁、前田佳均、佐道泰造、宮尾正信
"アモルファス鉄シリサイド半導体の水素化"
JAERI-Conf, 2002-014, 12-13頁、2002.
由利彰崇、吉武 剛、永山邦仁、佐道泰造、宮尾正信
"対向ターゲット式DC スパッタリング法によるアモルファスライクFeSi2 薄膜の作製とその基本特性"
JAERI-Conf, 2002-014, 39-40頁、2002.
矢田部 学、吉武 剛、永山邦仁
"PLD 法によるアモルファスFeSix 膜の作製とその評価"
JAERI-Conf, 2002-014, 41-42頁、2002.
中垣内 大、吉武 剛、永山邦仁
"レーザーアブレーション法によるFe3Si強磁性薄膜の作製"
JAERI-Conf, 2002-014, 45-46頁、2002.
佐道泰造、尾渡正和、村上裕二、権丈 淳、由利彰崇、吉武 剛、宮尾正信
"Ge添加による"β-FeSi2固相成長層の歪み制御"
JAERI-Conf, 2002-014, 8-9頁、2002.
村上裕二、権丈 淳、佐道泰造、吉武 剛、宮尾正信
"イオン線照射によるβ-FeSi2固相成長の促進"
JAERI-Conf, 2002-014, 16-17頁、2002.
Tsuyoshi Yoshitake, Gosuke Shiraishi, and Kunihito Nagayama
"Elimination of droplets using a vane velocity filter in pulsed laser ablation
of FeSi2"
Applied Surface Science, Volumes 197-198, 30 September 2002, Pages 379-383
Tsuyoshi Yoshitake, Takashi Nishiyama, Takeshi Hara, and Kunihito Nagayama
"Consideration of Growth Process of Diamond Thin Films in Ambient Oxygen by
Pulsed Laser Ablation of Graphite"
Applied Surface Science, Volumes 197-198, 30 September 2002, Pages 352-356
Hiromitsu Hayashi, Souhachi Iwasa, Nilesh J. Vasa, Tsuyoshi Yoshitake, Kiyotaka
Ueda, Shigeru Yokoyama, Sadao Higuchi, Hirohito Takeshita and Michitaka Nakahara
" Fabrication of Bi-doped YIG optical thin film for electric current sensor by
pulsed laser deposition "
Applied Surface Science, Volumes 197-198, 30 September 2002, Pages 463-466
吉武 剛
”ホール効果測定による半導体の電気特性評価”
九州大学中央分析センターセンターニュース、Vol. 21、No.2、1-4頁、2002.
吉武 剛
”レーザーアブレーション法による高品質ダイヤモンド状炭素およびダイヤモンド薄膜の作製”
日本板硝子研究助成会報告書、20、40-44頁、2002.
Nilesh J. Vasa, Daisuke Yamashita, Tsuyoshi Yoshitake, and Shigeru Yokoyama
"Influences of Electric and Magnetic Field on Fabrication of Y1Ba2Cu3O7-x Thin
Film by Pulsed Laser Deposition"
Report of Institute for Ionized Gas and Laser Research, Kyushu University, No.
12, pp. 56-57, 2002.
原武嗣、吉武 剛、永山邦仁
"レーザーアブレーション法を用いたダイヤモンド薄膜成長における基板温度の効果"
電離気体実験施設報告書、第12号、34-35頁、2002.
由利彰崇、吉武 剛、永山邦仁、佐道泰造、宮尾正信
"対向ターゲット式DCスパッタリング法によるβ-FeSi2薄膜の作製とその基本特性"
電離気体実験施設報告書、第12号、32-33頁、2002.
Tsuyoshi Yoshitake, Takeshi Hara, Takashi Nishiyama, and Kunihito Nagayama
"The Roles of ambient oxygen and substrate temperature on growth of diamond thin
films by pulsed laser deposition"
International Journal of Modern Physics B, Vol. 16, Nos. 6 & 7 (2002) 825-829.
Tsuyoshi Yoshitake, Gousuke Shiraishi, and Kunihito Nagayama
"Droplet-free thin films deposited by pulsed laser deposition using a mechanical
filter"
Japanese. Journal Applied Physics, Vol. 41 (2002) 836-837.
Hiromitsu Hayashi, Souhachi Iwasa, Nilesh J. Vasa, Tsuyoshi Yoshitake, Kiyotaka
Ueda, Shigeru Yokoyama and Sadao Higuchi
"Characteristics of Bi:YIG Magneto-Optic Thin Films Fabricated by Pulsed Laser
Deposition Method for an Optical Current Transformer"
Japanese Journal Applied Physics, Vol. 41 (2002) 410-411.
2001
H. Hayashi, S. Iwasa, N. J. Vasa,
T. Yoshitake, K. Ueda, S. Yokoyama and S. Higuchi
" Fabrication of Bi-YIG magneto-optic thin film by pulsed laser deposition
method for an optical current transformer "
Proceedings of the international symposium on laser-aided plasma diagnostics,
pp. 259-264, 2001.
D. Yamashita, O. Kusano, N. J. Vasa, T. Yoshitake, S. Yokoyama and K. Ueda
"Influence of electric and magnetic field on pulsed laser deposition of
Y1Ba2Cu3O7-x superconducting thin films"
Proceedings of the international symposium on laser-aided plasma diagnostics,
pp. 356-361, 2001.
Tsuyoshi Yoshitake, Yusuke Mukae and Kunihito Nagayama
"Formation of calcium silicide thin film by pulsed laser ablation of Ca2Si
alloy"
Report of Institute for Ionized Gas and Laser Research, Kyushu University, No.
11 , pp. 32-33, 2001.
吉武 剛、西山貴史、原 武嗣、永山邦仁
”レーザーアブレーション法を用いたダイヤモンド薄膜のホモ成長”
電離気体実験施設報告書、第11号、34-35頁、2001.
Tsuyoshi Yoshitake, Takashi Nishiyama and Kunihito Nagayama
"Homo-Growth of Diamond Single Phase Thin Films by Pulsed Laser Ablation of
Graphite"
Jpn. J. Appl. Phys. Vol.40, No.6A, pp.L573 - L575, 2001.
Tsuyoshi Yoshitake, Yusuke Mukae and Kunihito Nagayama
"Preparation of calcium silicide thin films on Si(100) and SiO2 substrates by
pulsed laser ablation of a Ca2Si alloy target"
Transactions of the Materials Research Society of Japan,
Vol.
26, pp. 1207-1210,
2001.
吉武 剛、西山貴史、原 武嗣、永山邦仁
"ArFレーザーを用いたPLD法によるダイヤモンド薄膜のホモ成長"
電気学会 光・量子デバイス研究会資料、pp. 43-46, 2001
Tsuyoshi Yoshitake, Tatsuya Nagamoto and Kunihito Nagayama
" Microstructure of beta-FeSi2 Thin Films by Pulsed Laser Deposition "
Thin Solid Films, Vol.
381, pp. 236-243, 2001.
Department of Applied Science for Electronics and Materials, Kyushu University
